Titanium oxide films were deposited on glass and metallic substrates with dc magnetron sputtering and also with pulsed dc magnetron sputtering at room temperature from 7.5mm titanium target with 99.995% purity, in reactive atmosphere with mix of argon and oxygen gas. The sputtering was carried out using a 5kW power supply, with possibility to change pulsed frequency from 5 to 350 kHz, and reverse time from 0.4 to 5ps, and reverse voltage 10% of operation voltage.

The gas argon was fed to the chamber independent of the reactive oxygen. Flows for both, argon and oxygen were regulated using Bronkorst mass flow controller, operated by Bronkorst control unit. Pressure monitoring in the sputtering chamber was made by Balzers penning and pirani with TPG 300 monitor unit.

All experiments were performed with target to substrate distance of 6cm, and depositions were started after pumping the chamber to a base pressure of 1×10-6mbar. Reflexion data were taken on a Perkin Elmer Lambda 9 NIR/UV/VIS Spectrophotometer and solar absorption was evaluated to be in account solar spectrum (AM1, 5) partition in 20 wavelength ranges of equal energy. Thermal emissivity was measured with an AE emissometer of Sevices & Services at an equilibrium temperature of 82°C and after adequate calibration. Optical properties values were evaluated with an uncertainty not exceeding ± 1%.

First experiments had in consideration the already known dependence of film morphology relatively to deposition parameters, and allowed to narrow the possible range of values variation for deposition parameters, with the final objective to reach highest as possible solar absorber selectivity [3]. Some coatings were prepared with constant oxygen flow rate and others with oxygen flow rate increasing gradually from the beginning to the end of deposition. Pulsed dc frequency and reverse time were also parameters taken in consideration.