Usage of Self-formation in PV

In self-formation [4] only the first photo-mask, to create initial object, and sequence of chaotic or oriented media are brought from outside.

Fig. 4: Self-formation version transformation takes place.

If the interaction between a chaotic medium and structural object causes an evolution of configurations involving changes in the number of figures, we have self-formation.

Fig. 5. Technological graph of solar cell manufacturing with 5 patterning processes

The interaction matrix describes the way in which medium will interact with initial object. If in the object there are peculiar points and the evolution goes through them there is the possibility to form the new patterns self-aligned with the initial object without structured media using. The possible evolution result in self-formation depends on interaction matrix, interaction set, form of initial object and evolution graph. Multivaluedness of initial object evolution if interaction matrix stable, is based on evolution possibility to move object boundary inside or outside (upwards or downwards). After the defined time of evolution the equidistant surfaces S1 or S-1 will be

formed from initial object surface S0. Which of surfaces will be formed depends on interaction direction.

On basis of surfaces S1 or S-1 under the other interaction the new equidistant surfaces can be created. In other words we can have an evolution graph defining an order of evolution steps:

S-3^ S-2* S-1< S0^ S1 > S2^S3

Undoubtedly we can construct infinite combinations of evolution graphs. The simplest of them is the reverse graph defining reverse evolution.

S0 ^ S1
S-1 ^

In most self-formation cases evolution is irreversible and is a main cause of self-formation arising. In all cases the evolution graph is defined by man or automatics through the media sequence and sometimes through evolution duration. Different evolution graphs are the
reason of solar cells difference which can be self-formed from similar initial object. These processes were simulated by software [5] created especially for self-formation investigation. Both media sequences are based on initial object evolution upwards-downwards.

In both versions initial object is doping glass island, which after serves as mask in silicon wafer etching. In both versions spatial surface evolution upwards — downwards is played. Spatial object with peculiar points is going through evolution until the mapping of these points at the top of object disappears. The evolution direction changes by medium changing and the new structures arise.

The result of technological graphs in Fig.5 and Fig.6 a are the same — PERL type SSC. But the first is formed by external formation with five patterning processes and the second is self-formed. The initial object in this version is formed by photolitography and the other patterns are self-formed from doping glasses, or by electroless metal plating. The other graph reflects self-formation of one-sided solar cell. The important feature is spin-on doping glasses used in these versions, what permit doping source coating, localisation and diffusion.